| Item | Brand | Machine type | Wave length | Application and Advantage | ||||||
| Micro Processing Excimer Laser Gas | Coherent | ATL ARF-1 | 193 nm | Industrial technology upgrades and transformations require balancing the growing demand for performance with the contradictions of processing speed and manufacturing costs. The advent of excimer lasers, distinguished by their high photon energy, positions excimer lasers at the forefront of cutting-edge industrial laser solutions in an era where breaking material limitations is increasingly urgent. As representatives of the most effective and reliable pulsed ultraviolet laser technology today, excimer lasers have significantly advanced technological innovations in various growing industries, including semiconductor, AMOLED flat-panel displays, thin films, silicon wafer processing, organic-metal precipitation, high-temperature superconductors, etching, material research, automotive manufacturing, biomedicine, fiber optics, diamond marking equipment, and alternative energy. Excimer laser gases are crucial for the laser generator in excimer laser devices. The advantages of excimer our pre-mixed gases include: Utilization of the highest purity raw gases. Precision formulation through an automated gas pre-mixing system, effectively reducing the impact of human factors. Packaging of cylinders using unique passivation techniques to ensure the proportion of trace reactive gases, guaranteeing reliable stability. |
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| ATL KRF-1 | 248 nm | |||||||||
| CTFTS-ARFV 2.2 | 193 nm | |||||||||
| CTFTS-KRFV 2.1 | 248 nm | |||||||||
| CTFTS-KRFV 2.2 | 248 nm | |||||||||
| CTMD-ARFV 2.0 | 193 nm | |||||||||
| CTMD-XECLV 2.1 | 308 nm | |||||||||
| TMN-ARFV 2.0C | 193 nm | |||||||||
| CTMN-ARFV 2.1 | 193 nm | |||||||||
| CTMN-KRFV 1.0 | 248 nm | |||||||||
| CTMN-KRFV 2.0 | 248 nm | |||||||||
| CTMN-XECLV 2.0 | 308 nm | |||||||||
| CTMN-XECLV 5.0 | 308 nm | |||||||||
| CTMN-XEFV 1.1 | 450nm 520nm | |||||||||
| CTMN-XEFV 1.2 | 450nm 520nm | |||||||||
| Photomedex | XeCl | 308 nm | ||||||||
| Photoscribe | ArF | 193 nm | ||||||||
| KrF | 248 nm | |||||||||
| PotomacPhotonics | ArF | 193 nm | ||||||||
| KrF | 248 nm | |||||||||
| Spectranetics | XeCl | 308 nm | ||||||||
